Influence of duty cycle on biocompatibility of nanostructured tantalum film deposited by pulsed DC PACVD

Volume 1, Issue 1, October 2016     |     PP. 31-36      |     PDF (485 K)    |     Pub. Date: October 17, 2016
DOI:    428 Downloads     8038 Views  

Author(s)

H. Ghorbani, Department of Materials Eng., Tarbiat Modares University, P. O. Box 14115-143, Tehran, Iran
A. Abdollah-zadeh, Department of Materials Eng., Tarbiat Modares University, P. O. Box 14115-143, Tehran, Iran
A. Poladi, Faculty of Materials Science and Eng., Semnan University, P. O. Box 35131-19111, Semnan, Iran

Abstract
Nanostructured Tantalum (Ta) thin films were deposited by plasma assisted chemical vapor deposition (PACVD) at duty cycles of 17%, 25%, and 33%. FESEM and MTT assay indicated that the Ta film deposited at duty cycle of 25% provides the best surface biocompatibility because of its flawless and uniform structure. Furthermore, Rockwell adhesion test indicated that the best film adhesion observed in Ta film that deposited at duty cycle of 25% and this attributed to its dominant α-phase structure.

Keywords
Keywords: Nanostructure; Tantalum; PACVD; Biocompatibility

Cite this paper
H. Ghorbani, A. Abdollah-zadeh, A. Poladi, Influence of duty cycle on biocompatibility of nanostructured tantalum film deposited by pulsed DC PACVD , SCIREA Journal of Materials. Volume 1, Issue 1, October 2016 | PP. 31-36.

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